Plasma analysis of the Particle-PLUS simultaneous sputtering device.
Analysis of dual magnetron sputtering considering the accurate shape is possible.
The particle method plasma analysis software 'Particle-PLUS', developed by Wavefront Inc., can analyze simultaneous magnetron sputtering in devices where the substrate and target are not in equilibrium. With the cut cell creation function, it allows for high-precision electric field calculations characteristic of orthogonal grids while considering accurate shapes and normal directions. *For more details, please download the PDF or feel free to contact us.*
- Company：ウェーブフロント 本社
- Price：Other
